Aller au menu Aller au contenu
Microelectronics, electromagnetism, photonics , microwave

> Platform > Technology > Lithography

Lithography, etching, chemistry

Photoresist and polymers deposition by spin coating

Spin coater Süss Microtec TP6000
  • Substrates up to 3 inches

Photolithography

PhotolithographyMask aligner Süss Microtec- type MA6:
  • * Mask 4 inches
  • * Substrates 3 inches
  • * Vacuum contact, hard/soft contact, proximity contact
    Features down to 0,6 micron
    High precision alignment stage




Wet Chemical etching

  Thin layers etching, photoresist development

Dry chemical etching

Equipment Corial 200IL/ICP Equipment Corial 200IL RIE/ICP
Fluoride gases, plasma O2









Thermal treatment

Heating under vacuum or under controlled atmosphere (nitrogen)

Chemistry

Manipulation of acids or solvents for etching (HF ...), cleaning (F NO3, photoresist remover)...

Written by Brigitte Rasolofoniaina

Date of update October 5, 2018

français
IMEP-LAHC
Grenoble site
Grenoble INP - Minatec : 3, Parvis Louis Néel - CS 50257 - 38016 Grenoble Cedex 1

Chambéry site
Université de Savoie - F73376 Le Bourget du Lac Cedex
 


  CNRS  http://www.cnrs.fr      Site Grenoble-INP http://www.grenoble-inp.fr       Université Grenoble Alpes (UGA)      Université Savoie Mont Blanc
Univ. Grenoble Alpes