Aller au menu Aller au contenu
Microelectronics, electromagnetism, photonics , microwave

> Platform > Technology > Thin layers deposition

Thin layers deposition : metallic and dielectric

Materials:     aluminium    gold        silicon        titanium        ...
                      alumina       chrome    silica          tungsten
 

RF Magnetron Sputter deposition and Joule effect evaporation: PLASSYS - type MEP 300

  •  Dry vacuum: Turbomolecular pump and dry primar  vacuum pump, 5.10-7 mbar
  • 3 to 6 substrates 2 to 3 inches
  • Heating: temperature up to 250°C
  • 2 sets of evaporation electrodes
  • 1 target - diameter 4 inches
Oxide films are elaborated using reactive sputtering. The composition of the film can be controlled by varying the relative pressures of the inert and reactive gas (O2).Depôt en cours                 Bâti de depôt PLASSYS

Joule effect evaporation EDWARDS - type E306A

Evaporateur EDWARDS   
  * Turbomolecular pump and mechanical primary vacuum pump, 5.10-7 mbar  
  * Thickness and deposition control
  * 4 substrates diameter 6 cm
  * Heating temperature up to 120°C 
                  
            

RF sputtering system ALCATEL - type SCM 600

Bâti de depôt ALCATEL
 
* Turbomolecular pump, vacuum 2.10-7 mbar
* 4 targets, diameter 4 inches
* 1 substrate diameter 6 cm
* Heating: temperature up to 250°C
* Multilayer possibility

Written by Brigitte Rasolofoniaina

Date of update October 5, 2018

français
IMEP-LAHC
Grenoble site
Grenoble INP - Minatec : 3, Parvis Louis Néel - CS 50257 - 38016 Grenoble Cedex 1

Chambéry site
Université de Savoie - F73376 Le Bourget du Lac Cedex
 


  CNRS  http://www.cnrs.fr      Site Grenoble-INP http://www.grenoble-inp.fr       Université Grenoble Alpes (UGA)      Université Savoie Mont Blanc
Univ. Grenoble Alpes