Metallic and dielectric layers deposition
Materials: aluminium gold silicon titan ...
alumina chromium silica tungsten
Gaz process : Ar, O2
Cathodic RF magnetron sputtering and Joule effect evaporation: PLASSYS - MEP 300
Joule effect evaporation - EDWARDS - E306A
Cathodic RF magnetron sputtering- ALCATEL - SCM 600
Date of update May 16, 2019