logo N&B

Thin layers deposition : metallic and dielectric - Grenoble INP - IMEP-LAHC

Imprimer la page Français

Thin layers deposition : metallic and dielectric

Materials:     aluminium    gold        silicon        titanium        ...
                      alumina       chrome    silica          tungsten

RF Magnetron Sputter deposition and Joule effect evaporation: PLASSYS - type MEP 300

  •  Dry vacuum: Turbomolecular pump and dry primar  vacuum pump, 5.10-7 mbar
  • 3 to 6 substrates 2 to 3 inches
  • Heating: temperature up to 250°C
  • 2 sets of evaporation electrodes
  • 1 target - diameter 4 inches
Oxide films are elaborated using reactive sputtering. The composition of the film can be controlled by varying the relative pressures of the inert and reactive gas (O2).Depôt en cours                 Bâti de depôt PLASSYS

Joule effect evaporation EDWARDS - type E306A

Evaporateur EDWARDS   
  * Turbomolecular pump and mechanical primary vacuum pump, 5.10-7 mbar  
  * Thickness and deposition control
  * 4 substrates diameter 6 cm
  * Heating temperature up to 120°C 
                  
            

RF sputtering system ALCATEL - type SCM 600

Bâti de depôt ALCATEL
 
* Turbomolecular pump, vacuum 2.10-7 mbar
* 4 targets, diameter 4 inches
* 1 substrate diameter 6 cm
* Heating: temperature up to 250°C
* Multilayer possibility
 
IMEP-LAHC - UMR 5130
Site Grenoble
Grenoble INP - Minatec : 3, Parvis Louis Néel - CS 50257 - 38016 Grenoble Cedex 1

Site Chambéry
Université de Savoie - F73376 Le Bourget du Lac Cedex Copyright Grenoble INP