Lithography

Resist and polymers deposition by spin coating:

Spin coater Süss Microtec TP6000
Substrates : max. diameter 4"

- Hot plates for soft and hardbake

UVPhotolithography:

UV Source:h-line / 405nm and i-line / 365nm

Equipment Süss Microtec - MA6:

* Masks 4'' to 5"

* Substrates: max. diameter 3''

* Vacuum contact / Soft contact / Hard contact / Proximity :

- Resolution : 0,6 micron

- Alignement in BSA

Equipment Süss Microtec- MJB3:

* Masks 4 to 5"

    * Substrates: max diameter 3"
    * Vacuum contact / Soft contact :
           - Resolution : 1 micron
       - Alignement in BSA

Date of update May 10, 2019

Contribuer

Grenoble site
Grenoble INP - Minatec : 3, Parvis Louis Néel - CS 50257 - 38016 Grenoble Cedex 1

Chambery site
Université Savoie Mont Blanc - Rue Lac de la Thuile, Bat. 21 - 73370 Le Bourget du Lac

www.grenoble-inp.fr/suivez-nous

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