Lithography, etching, chemistry
Photoresist and polymers deposition by spin coating
Photolithography
Wet Chemical etching
Thin layers etching, photoresist development
Thermal treatment
Heating under vacuum or under controlled atmosphere (nitrogen)
Chemistry
Manipulation of acids or solvents for etching (HF ...), cleaning (F NO3, photoresist remover)...
Date of update October 5, 2018